Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Dries Smeets

Arno Jan Bleeker

Heine Melle Mulder

Erik Roelof Loopstra

Pieter Willem Herman De Jager

Dirk Heinrich Ehm

Erwin John Van Zwet

Jeroen Huijbregtse

Edwin Te Sligte

Alexey Sergeevich Kuznetsov

Rudy Jan Maria Pellens

Irene Ament

Arnoldus Jan Storm

Hermanus Hendricus Petrus Theodorus Bekman

Robert Paul Ebeling

Tina Graber

Christopher James Lee

Wouter Dick Koek

An optical element (), comprising: a substrate (), an EUV radiation reflecting multilayer system () applied to the substrate, and a protective layer system () applied to the multilayer system and having at least a first and a second layer (). The first layer () is arranged closer to the multilayer system () than is the second layer () and serves as a diffusion barrier for hydrogen. This first layer () has a lower solubility for hydrogen than does the second layer (), which serves for absorbing hydrogen. Also disclosed are an optical system for EUV lithography with at least one such optical element, and a method for treating an optical element in order to remove hydrogen incorporated in at least one layer () of the protective layer system and/or in at least one layer () of the multilayer system ().

Optical element and optical system for EUV lithography, and method for treating such an optical element

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method

A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Device, lithographic apparatus, method for guiding radiation and device manufacturing method

Growing community of inventors

Hasselt, Belgium

Dries Smeets