The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2017

Filed:

Jan. 27, 2014
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Dries Smeets, Hasselt, BE;

Arno Jan Bleeker, Westerhoven, NL;

Christopher James Lee, Enschede, NL;

Pieter Willem Herman De Jager, Middelbeers, NL;

Heine Melle Mulder, Veldhoven, NL;

Rudy Jan Maria Pellens, Overpelt, BE;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G03F 7/70291 (2013.01);
Abstract

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.


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