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For the Inventor, By the Inventor

Overpelt, Belgium

Rudy Jan Maria Pellens

This inventor holds 7 USPTO granted patents and 2 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2009-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rudy Jan Maria Pellens. Retrieved from https://idiyas.com/inventor/rudy-jan-maria-pellens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 42.9

Average Co-Inventor Count = 3.2

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal7 out of 5,076 
 
Asml Netherlands B.v.
 patents

Years Active: 2009-2017

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7 patents (USPTO):Explore Patents
1. 9823576 - Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method (2017-11-21),
2. 8780321 - Lithographic apparatus and device manufacturing method (2014-07-15),
3. 8576374 - Lithographic apparatus and method (2013-11-05),
4. 7892903 - Device manufacturing method and substrate comprising multiple resist layers (2011-02-22),
5. 7879514 - Lithographic method and patterning device (2011-02-01),
6. 7626681 - Lithographic apparatus and method (2009-12-01),
7. 7494828 - Substrate holder and device manufacturing method (2009-02-24),

Title: Innovator Spotlight: Rudy Jan Maria Pellens

Introduction:

Rudy Jan Maria Pellens, a prolific inventor in the field of lithography, hails from Overpelt, Belgium. With a remarkable portfolio of 7 patents, Pellens has been at the forefront of developing cutting-edge technologies in the realm of radiation modulation and lithography apparatus.

Latest Patents:

Recently, Rudy Jan Maria Pellens secured patents for a radiation modulator designed for a lithography apparatus. This innovative modulator features a sophisticated system of waveguides to support the propagation of radiation below 450 nm wavelength. Pellens' patents also encompass a lithography apparatus with a unique liquid displacing device that utilizes localized gas flow to remove liquid from the target or sensor, enhancing precision in the manufacturing process.

Career Highlights:

Pellens' career has been closely associated with ASML Netherlands B.V., a prominent player in the semiconductor industry. His inventive contributions have significantly advanced lithographic technologies, earning him recognition as a key figure in the development of next-generation lithography systems.

Collaborations:

Throughout his career, Rudy Jan Maria Pellens has collaborated with esteemed professionals in the field, including his coworkers Keith Frank Best and Cheng-Qun Gui. Together, they have synergized their expertise to drive innovation and bring forth groundbreaking solutions in the domain of lithography.

Conclusion:

In conclusion, Rudy Jan Maria Pellens stands as a visionary inventor whose work has reshaped the landscape of lithography technology. His patents and collaborations underscore his commitment to pushing the boundaries of innovation, making him a notable figure in the world of advanced manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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