The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Dec. 04, 2009
Thijs Egidius Johannes Knaapen, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Martijn Hendrik Kamphuis, Veldhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Rudolf Adrianus Joannes Maas, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Coen Cornelis Wilhelmus Verspaget, Helmond, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
David Lucien Anstotz, Eindhoven, NL;
Gert-jan Gerardus Johannes Thomas Brands, Waalre, NL;
Marcus Johannes Van Der Zanden, Boekel, NL;
Vijay Kumar Badam, Eindhoven, NL;
Casper Roderik DE Groot, Eindhoven, NL;
Thijs Egidius Johannes Knaapen, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Martijn Hendrik Kamphuis, Veldhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Rudolf Adrianus Joannes Maas, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Coen Cornelis Wilhelmus Verspaget, Helmond, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
David Lucien Anstotz, Eindhoven, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Marcus Johannes Van Der Zanden, Boekel, NL;
Vijay Kumar Badam, Eindhoven, NL;
Casper Roderik De Groot, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.