Veldhoven, Netherlands

Paulus Martinus Maria Liebregts

USPTO Granted Patents = 34 

Average Co-Inventor Count = 6.4

ph-index = 6

Forward Citations = 98(Granted Patents)


Company Filing History:


Years Active: 2005-2020

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34 patents (USPTO):

Title: Unveiling the Innovations of Paulus Martinus Maria Liebregts in the Field of Lithography

Introduction: Paulus Martinus Maria Liebregts is a renowned inventor based in Veldhoven, Netherlands, with an impressive track record of 34 patents to his name. His groundbreaking work in the realm of lithography, particularly in immersion lithographic apparatus, has placed him at the forefront of technological advancements in the industry.

Latest Patents: Among his latest patents is an immersion lithographic apparatus designed to enhance the fluid supply system. This system features a chamber with strategically positioned inlet and outlet holes to optimize the direction of fluid flow, improving the overall efficiency of the lithographic process. Additionally, Liebregts has developed a novel fluid handling structure that plays a crucial role in device manufacturing methods within lithographic apparatus, incorporating elements such as elongate openings and gas knife devices for enhanced performance.

Career Highlights: Paulus Martinus Maria Liebregts is a valued member of the renowned company ASML Netherlands B.V., a leading player in the semiconductor industry. His contributions have significantly impacted the research and development efforts within the organization, driving forward innovation in lithographic technologies.

Collaborations: Throughout his career, Liebregts has had the pleasure of collaborating with esteemed professionals in the field, including his coworkers Michel Riepen and Martinus Hendrikus Antonius Leenders. Together, they have synergized their expertise to push the boundaries of technological advancements and achieve remarkable milestones in the realm of lithography.

Conclusion: In conclusion, Paulus Martinus Maria Liebregts stands as a visionary inventor whose remarkable contributions in the field of lithography have reshaped the industry landscape. His inventive spirit, coupled with his dedication to advancing technological frontiers, continues to inspire future generations of innovators in the pursuit of excellence.

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