The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Dec. 13, 2013
Asml Netherlands B.v., Veldhoven, NL;
Michel Riepen, Veldhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheez, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniël Jozef Maria Direcks, Simpleveld, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Eva Mondt, Eindhoven, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Mathieus Anna Karel Van Lierop, Eindhoven, NL;
Christophe De Metsenaere, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
Joris Johan Anne-Marie Verstraete, Waalre, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.