The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
May. 05, 2015
Asml Netherlands B.v., Veldhoven, NL;
Clemens Johannes Gerardus Van Den Dungen, Eindhoven, NL;
Nicolaas Franciscus Koppelaars, Oisterwijk, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Marcel Beckers, Eindhoven, NL;
Richard Moerman, Son, NL;
Cédric Désiré Grouwstra, Eindhoven, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Remko Jan Peter Verhees, Asten, NL;
Pieter Mulder, Duizel, NL;
Evert Van Vliet, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.