Asml Netherlands B.v.

Paulus Martinus Maria Liebregts

Michel Riepen

Martinus Hendrikus Antonius Leenders

Koen Steffens

Gert-Jan Gerardus Johannes Thomas Brands

Christiaan Alexander Hoogendam

Roelof Frederik De Graaf

Ronald Van Der Ham

Johannes Henricus Wilhelmus Jacobs

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Hans Jansen

Jan-Gerard Cornelis Van Der Toorn

Franciscus Johannes Joseph Janssen

Marcio Alexandre Cano Miranda

Paul Petrus Joannes Berkvens

Fabrizio Evangelista

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Erik Henricus Egidius Catharina Eummelen

Rogier Hendrikus Magdalena Cortie

Richard Moerman

Daniel Jozef Maria Direcks

Danny Maria Hubertus Philips

Pieter Mulder

Mathieus Anna Karel Van Lierop

Daniël Jozef Maria Direcks

Jeroen Johannes Sophia Maria Mertens

Marcel Beckers

Cédric Désiré Grouwstra

Eva Mondt

Clemens Johannes Gerardus Van Den Dungen

Evert Van Vliet

Nicolaas Franciscus Koppelaars

Vijay Kumar Badam

Remko Jan Peter Verhees

Marcus Adrianus Van De Kerkhof

Johannes Hubertus Josephina Moors

Nicolaas Rudolf Kemper

Marco Koert Stavenga

Nina Vladimirovna Dziomkina

Martijn Houben

Tammo Uitterdijk

Gert-Jan Heerens

Petrus Rutgerus Bartray

Marcus Johannes Van Der Zanden

Gerardus Martinus Antonius De Rooij

Johanna Antoinette Maria Sondag-Huethorst

Thijs Harink

Niek Elout De Kruijf

Jeroen Johannes Sophia M Mertens

Vadim Yevgenyevich Banine

Arno Jan Bleeker

Sergei Shulepov

Richard Joseph Bruls

Wilhelmus Josephus Box

Antonius Johannes Josephus Van Dijsseldonk

Ruud Hendrikus Martinus Johannes Bloks

Marinus Jochemsen

Bernardus Antonius Johannes Luttikhuis

David Bessems

Youri Johannes Laurentius Maria Van Dommelen

Jan Cornelis Van Der Hoeven

Hendrik Antony Johannes Neerhof

Robertus Nicodemus Jacobus Van Ballegoij

Hrishikesh Patel

Erik Leonardus Ham

Paul William Scholtes-Van Eijk

Rudy Jan Maria Pellens

Jan Willem Cromwijk

Pieter Lein Joseph Gunter

Jan-Jaap Kuit

Menno Fien

Coen Cornelis Wilhelmus Verspaget

Pertrus Rutgerus Bartray

Hua Li

Matheus Anna Karel Van Lierop

Ralph Joseph Meijers

David Lucien Anstotz

Erik Witberg

Henri Gerard Cato Werij

Casper Roderik De Groot

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Mustafa Amhaouch

Franciscus Catharina Bernardus Marinus Van Vroonhoven

Martijn Hendrik Kamphuis

Gert-Jan Geradus Johannes Thomas Brands

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Frederik Theodorus Elisabeth Heuts

Angelo Alexander Michael Van Engelen

Tim Anton Johan Meesters

Harry Borggreve

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

Fluid handling structure, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

Lithographic apparatus and device manufacturing method

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

Lithographic apparatus, removable member and device manufacturing method

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

Growing community of inventors

Veldhoven, Netherlands

Paulus Martinus Maria Liebregts