The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Aug. 04, 2006
Geoffrey Norman Phillipps, Luyksgestel, NL;
Cheng-qun Gui, Best, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Paulus Wilhelmus Leonardus Van Dijk, Tilburg, NL;
Geoffrey Norman Phillipps, Luyksgestel, NL;
Cheng-Qun Gui, Best, NL;
Rudy Jan Maria Pellens, Overpelt, BE;
Paulus Wilhelmus Leonardus Van Dijk, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.