Company Filing History:

46 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2004-2016

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49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9383195 - Lithographic apparatus and method (2016-07-05),

2. 9335638 - Lithographic apparatus, programmable patterning device and lithographic method (2016-05-10),

3. 8982318 - Lithographic apparatus and method (2015-03-17),

4. RE45284 - Lithographic apparatus and device manufacturing method (2014-12-08),

5. 8675175 - Lithographic apparatus and device manufacturing method (2014-03-18),

6. 8576374 - Lithographic apparatus and method (2013-11-05),

7. 8531648 - Lithographic apparatus, programmable patterning device and lithographic method (2013-09-10),

8. 8502954 - Lithographic apparatus and device manufacturing method (2013-08-06),

9. 8395755 - Lithographic apparatus and device manufacturing method (2013-03-12),

10. 8390787 - Lithographic apparatus and device manufacturing method (2013-03-05),

11. 8383325 - Lithographic apparatus and method (2013-02-26),

12. RE43515 - Lithographic apparatus and device manufacturing method (2012-07-16),

13. 8029973 - Lithographic method and carrier substrate (2011-10-04),

14. 7911586 - Lithographic apparatus and device manufacturing method (2011-03-22),

15. 7879514 - Lithographic method and patterning device (2011-02-01),

Title: The Ingenious Mind Behind 49 Patents: Cheng-Qun Gui

Introduction:

Cheng-Qun Gui, a prolific inventor based in Best, Netherlands, has made a remarkable impact in the field of lithographic technology with an impressive portfolio of 49 patents.

Latest Patents:

Among his latest patents is the groundbreaking "Lithographic Apparatus and Method," which revolutionizes the process of obtaining information on surface topography. By directing a beam of radiation at a flexible substrate and detecting changes in intensity distribution or angle of reflection, valuable topographical data is obtained.

Another notable invention is the "Lithographic Apparatus, Programmable Patterning Device, and Lithographic Method," which features a modulator that exposes an exposure area of the substrate to modulated beams, projecting them onto the substrate for precise patterning.

Career Highlights:

Gui's career has been intertwined with cutting-edge companies in the industry, prominently with ASML Netherlands B.V. and ASML Holding N.V. His innovative spirit and dedication have significantly contributed to the advancement of lithographic technologies.

Collaborations:

Throughout his illustrious career, Cheng-Qun Gui has collaborated with esteemed professionals such as Pieter Willem Herman De Jager and Henricus Wilhelmus Maria Van Buel. Together, they have pushed the boundaries of technological innovation and set new standards in the field.

Conclusion:

In conclusion, Cheng-Qun Gui stands as a beacon of ingenuity, with his 49 patents reflecting his profound impact on the realm of lithographic technology. His collaborations and career achievements underscore his status as a pioneering inventor, driving innovation and progress in the industry.

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2 patents (EPO):

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