The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Mar. 08, 2013
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Richard Alexander George, Son en Breugel, NL;
Cheng-Qun Gui, Best, NL;
Pieter Willem Herman De Jager, Rotterdam, NL;
Robbert Edgar Van Leeuwen, Eindhoven, NL;
Jacobus Burghoorn, Haelen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/74 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.