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For the Inventor, By the Inventor

Haelen, Netherlands

Jacobus Burghoorn

This inventor holds 17 USPTO granted patents, primarily in Lithography Technology. Top assignee: Asml Netherlands B.v.. Active years: 2003-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacobus Burghoorn. Retrieved from https://idiyas.com/inventor/jacobus-burghoorn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17

% Patents Active = 70.6

Average Co-Inventor Count = 4.1

ph-index = 7

Forward Citations = 114(Granted Patents)


Company Filing History:

goldMedal17 out of 5,087 
 
Asml Netherlands B.v.
 patents

Years Active: 2003-2014

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Areas of Expertise:
Lithographic Apparatus
Device Manufacturing
Alignment Systems
Marker Structure
Exposure Apparatus
Tilted Focus
Interferometric Alignment
Multi-Layered Substrate
Substrate Production
Vacuum-Based Systems
17 patents (USPTO):Explore Patents
1. 8675175 - Lithographic apparatus and device manufacturing method (2014-03-18),
2. 8395755 - Lithographic apparatus and device manufacturing method (2013-03-12),
3. 8264664 - Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method (2012-09-11),
4. 8139217 - Alignment systems and methods for lithographic systems (2012-03-20),
5. 7880880 - Alignment systems and methods for lithographic systems (2011-02-01),
6. 7879682 - Marker structure and method for controlling alignment of layers of a multi-layered substrate (2011-02-01),
7. 7834975 - Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly (2010-11-16),
8. 7629697 - Marker structure and method for controlling alignment of layers of a multi-layered substrate (2009-12-08),
9. 7576834 - Lithographic apparatus and device manufacturing method (2009-08-18),
10. 7518706 - Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly (2009-04-14),
11. 7476490 - Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method (2009-01-13),
12. 7439531 - Alignment systems and methods for lithographic systems (2008-10-21),
13. 7332732 - Alignment systems and methods for lithographic systems (2008-02-19),
14. 7329888 - Alignment systems and methods for lithographic systems (2008-02-12),
15. 7297971 - Alignment systems and methods for lithographic systems (2007-11-20),

Title: Jacobus Burghoorn - Innovative Mind from Haelen, NL

Introduction: Jacobus Burghoorn is a visionary inventor hailing from Haelen, Netherlands, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jacobus Burghoorn holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to modern challenges.

Career Highlights: Throughout his illustrious career, Jacobus Burghoorn has consistently pushed the boundaries of innovation, with his inventions revolutionizing industries and improving the lives of many around the world.

Collaborations: Jacobus Burghoorn has collaborated with leading research institutions, universities, and companies to further develop and implement his innovative ideas, demonstrating his commitment to driving progress through teamwork and cooperation.

Conclusion: Jacobus Burghoorn's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a pioneering inventor in the global technological landscape, inspiring future generations to continue pushing the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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