Asml Netherlands B.v.

Jacobus Burghoorn

Richard Johannes Franciscus Van Haren

Andre Bernardus Jeunink

Paul Christiaan Hinnen

Hubertus Johannes Gertrudus Simons

Franciscus Bernardus Maria Van Bilsen

Hoite Pieter Theodoor Tolsma

Henry Megens

Jeroen Huijbregtse

Sicco Ian Schets

Ramon Navarro Y Koren

Hermanus Gerardus Van Horssen

Allan Reuben Dunbar

Johny Rutger Schuurhuis

Brian Young Bok Lee

Arie Jeffrey Den Boef

Maurits Van Der Schaar

Pieter Willem Herman De Jager

Cheng-Qun Gui

Robbert Edgar Van Leeuwen

Richard Alexander George

Martinus Hendrikus Antonius Leenders

Everhardus Cornelis Mos

Uwe Mickan

Rene Monshouwer

Jan Hauschild

Roeland Nicolaas Maria Vanneer

Bartolomeus Petrus Rijpers

Bart Rijpers

A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Lithographic apparatus and device manufacturing method

A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.

Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Alignment systems and methods for lithographic systems

The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.

Marker structure and method for controlling alignment of layers of a multi-layered substrate

A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly

A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.

The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.

Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly

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Haelen, Netherlands

Jacobus Burghoorn