The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Nov. 12, 2004
Richard Johannes Franciscus Van Haren, Waalre, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Jacobus Burghoorn, Haelen, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Bartolomeus Petrus Rijpers, Nuenen, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Jacobus Burghoorn, Haelen, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Bartolomeus Petrus Rijpers, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.