Eindhoven, Netherlands

Maurits Van Der Schaar

USPTO Granted Patents = 124 

 

Average Co-Inventor Count = 4.1

ph-index = 14

Forward Citations = 824(Granted Patents)

DiyaCoin DiyaCoin 1.20 


Inventors with similar research interests:


Location History:

  • Veldoven, NL (2004)
  • Veldhoven, NL (2004 - 2022)
  • Eindhoven, NL (2009 - 2024)

Company Filing History:


Years Active: 2004-2025

where 'Filed Patents' based on already Granted Patents

124 patents (USPTO):

Title: Innovator Spotlight: Maurits Van Der Schaar

Introduction:

Maurits Van Der Schaar, an accomplished inventor based in Eindhoven, NL, is renowned for his remarkable contributions to the field of technology, with an impressive portfolio of 115 patents under his belt. His inventive spirit and dedication to innovation have positioned him as a key figure in the industry, particularly in the realm of metrology targets and apparatus.

Latest Patents:

Van Der Schaar's latest patents showcase his expertise in metrology targets and methods for determining characteristics of structures on substrates. One of his innovations includes a unique patterning device designed to pattern product structures onto a substrate with target patterning elements that enable the inference of parameters of interest. These elements are strategically configured to ensure the targets have boundaries that deviate from standard perpendicular or parallel orientations. Additionally, he has developed a sophisticated metrology apparatus and method for determining characteristics of structures on substrates by calculating interference electric fields resulting from radiation scattering.

Career Highlights:

Throughout his illustrious career, Maurits Van Der Schaar has made significant strides in the technology sector. He has been associated with leading companies such as ASML Netherlands B.V. and ASML Holding N.V., where his inventive prowess has played a pivotal role in driving technological advancements in the industry. His innovative solutions have not only enhanced operational efficiencies but have also set new standards for precision and accuracy in metrology applications.

Collaborations:

Van Der Schaar's collaborative efforts with esteemed colleagues like Arie Jeffrey Den Boef and Everhardus Cornelis Mos have further enriched his inventive journey. Working alongside these talented individuals has enabled Maurits to explore new ideas, exchange valuable insights, and push the boundaries of technological innovation. The synergy within his professional network has undoubtedly contributed to the success of his groundbreaking inventions.

Conclusion:

In conclusion, Maurits Van Der Schaar stands as a beacon of innovation in the realm of technology, with a stellar track record of patents and inventions that have redefined the industry. His forward-thinking approach, coupled with his technical expertise, continues to inspire a new generation of inventors and engineers. Van Der Schaar's contributions to metrology targets and methods reflect his unwavering commitment to driving progress and shaping the future of technology.

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