The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Dec. 22, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Guangqing Chen, Fremont, CA (US);
Wei Liu, Los Altos, CA (US);
Maurits Van Der Schaar, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01B 11/00 (2006.01); G01B 11/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01B 11/00 (2013.01); G01B 11/303 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01);
Abstract
A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.