The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2023
Filed:
Mar. 24, 2016
Asml Netherlands B.v., Veldhoven, NL;
Lotte Marloes Willems, Eindhoven, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Panagiotis Pieter Bintevinos, Best, NL;
Guangqing Chen, Fremont, CA (US);
Martin Ebert, Valkenswaard, NL;
Pieter Jacob Mathias Hendrik Knelissen, Roermond, NL;
Stephen Morgan, Son en Breugel, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Leonardus Henricus Marie Verstappen, Weert, NL;
Jen-Shiang Wang, Sunnyvale, CA (US);
Peter Hanzen Wardenier, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.