Company Filing History:

11 out of 4,883

Asml Netherlands B.v.

patents

5 out of 14,087

U.S. Philips Corporation

patents

Years Active: 1990-2025

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16 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12204826 - Method and apparatus for inspection and metrology (2025-01-21),

2. 11580274 - Method and apparatus for inspection and metrology (2023-02-14),

3. 11036146 - Method and apparatus to reduce effects of nonlinear behavior (2021-06-15),

4. 10996573 - Method and system for increasing accuracy of pattern positioning (2021-05-04),

5. 10915689 - Method and apparatus to correct for patterning process error (2021-02-09),

6. 10719011 - Method and apparatus to correct for patterning process error (2020-07-21),

7. 10691863 - Method and apparatus to correct for patterning process error (2020-06-23),

8. 9958789 - Method of metrology, inspection apparatus, lithographic system and device manufacturing method (2018-05-01),

9. 9786044 - Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method (2017-10-10),

10. 8184265 - Correction method for non-uniform reticle heating in a lithographic apparatus (2012-05-22),

11. 7511799 - Lithographic projection apparatus and a device manufacturing method (2009-03-31),

12. 5742165 - Magnetic resonance apparatus (1998-04-21),

13. 5450011 - Magnetic resonance apparatus having a wideband matching network (1995-09-12),

14. 5319309 - Magnetic resonance device and signal combination device (1994-06-07),

15. 5272437 - RF coil system in a magnetic resonance imaging apparatus (1993-12-21),

Title: Innovator Spotlight: Peter Hanzen Wardenier

Introduction:

Peter Hanzen Wardenier is a seasoned inventor based in Eindhoven, Netherlands, with an impressive portfolio of 15 patents under his name. His groundbreaking work in the field of metrology and nonlinear behavior has significantly contributed to advancements in the industry.

Latest Patents:

Among his latest patents is the "Method and apparatus for inspection and metrology," which involves evaluating metrology targets and recipes, receiving measurement data, and tuning parameters to enhance accuracy. Additionally, he developed the "Method and apparatus to reduce effects of nonlinear behavior," which focuses on minimizing patterning errors over time through innovative modifications.

Career Highlights:

Peter Hanzen Wardenier has made substantial contributions during his tenure at renowned companies such as ASML Netherlands B.V. and U.S. Philips Corporation. His expertise and dedication have been instrumental in driving technological innovation and pushing the boundaries of what is possible in the field of metrology.

Collaborations:

Throughout his career, Peter has collaborated with esteemed professionals like Peter Ten Berge and Richard Johannes Franciscus Van Haren. Their combined efforts have led to the development of cutting-edge solutions and technologies that have revolutionized the industry.

Conclusion:

In conclusion, Peter Hanzen Wardenier stands out as a visionary inventor whose relentless pursuit of excellence has left a lasting impact on the field of metrology. His innovative patents and collaborative efforts continue to inspire and shape the future of technological advancement.

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