The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Sep. 26, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Richard Johannes Franciscus Van Haren, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Peter Ten Berge, Eindhoven, NL;
Peter Hanzen Wardenier, Eindhoven, NL;
Erik Jensen, Veldhoven, NL;
Hakki Ergün Cekli, Singapore, SG;
Assignee:
ASML Netherlands B. V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/33 (2020.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70625 (2013.01); G03F 7/70641 (2013.01);
Abstract
A method including: obtaining information regarding a patterning error in a patterning process involving a patterning device; determining a nonlinearity over a period of time introduced by modifying the patterning error by a modification apparatus according to the patterning error information; and determining a patterning error offset for use with the modification apparatus based on the determined nonlinearity.