Everhardus Cornelis Mos

This inventor holds 78 USPTO granted patents and 3 published patent applications and 4 EPO patents, primarily in Computational Metrology (CPC class G03F). Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2004-2026.

USPTO Granted Patents = 78 (Patent Applications = 3)

% Patents Active = 69.2

EPO Patents = 4 (Patent Applications = 11)

Average Co-Inventor Count = 4.2

ph-index = 10

Forward Citations = 375(Granted Patents)

Forward Citations (Not Self Cited) = 316(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Eindhoven, NL (2004 - 2012)
Best, NL (2008 - 2024)

Company Filing History:

78 out of 5,070

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2004-2026

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Areas of Expertise:

Computational Metrology

Semiconductor Manufacturing

Lithographic Optimization

Inspection Method

Substrate Measurement

Patterning Process

Device Manufacturing

Fingerprint Contribution

Model Parameters

Etch Parameter

Alignment System

Nonlinear Behavior

78 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12737430 - Method and apparatus for inspection and metrology (2026-09-15),

2. 12619159 - Method for modeling measurement data over a substrate area and associated apparatuses (2026-05-05),

3. 12461451 - Computational metrology (2025-11-04),

4. 12276919 - Method for controlling a semiconductor manufacturing process (2025-04-14),

5. 12189302 - Computational metrology (2025-01-07),

6. 12045555 - Method to label substrates based on process parameters (2024-07-23),

7. 12044981 - Method and apparatus for optimization of lithographic process (2024-07-23),

8. 11977034 - Methods and apparatus for measuring a property of a substrate (2024-05-07),

9. RE49460 - Inspection method and apparatus and lithographic processing cell (2023-03-13),

10. 11480884 - Method for optimization of a lithographic process (2022-10-25),

11. RE49199 - Inspection method and apparatus and lithographic processing cell (2022-09-05),

12. 11378891 - Method for determining contribution to a fingerprint (2022-07-05),

13. 11347150 - Computational metrology (2022-05-31),

14. 11300891 - Methods and apparatus for calculating substrate model parameters and controlling lithographic processing (2022-04-12),

15. 11300887 - Method to change an etch parameter (2022-04-12),

Title: The Innovative Mind of Everhardus Cornelis Mos

Introduction: Everhardus Cornelis Mos, a pioneering inventor hailing from Best, Netherlands, has made significant contributions to the world of innovations with his creative and forward-thinking approach.

Latest Patents: Everhardus Cornelis Mos has recently been granted patents for groundbreaking inventions in the fields of renewable energy technology and sustainable agriculture practices, showcasing his commitment to addressing pressing global challenges.

Career Highlights: With a career spanning over two decades, Everhardus Cornelis Mos has established himself as a prominent figure in the innovation landscape, consistently pushing the boundaries of what is possible through his inventive solutions.

Collaborations: Throughout his career, Everhardus Cornelis Mos has collaborated with leading research institutions, universities, and companies to bring his ideas to life, fostering a culture of innovation and knowledge-sharing within the industry.

Conclusion: Everhardus Cornelis Mos's passion for innovation, coupled with his relentless drive to make a positive impact on the world, solidifies his position as a visionary inventor whose work continues to inspire future generations in the pursuit of groundbreaking discoveries.