The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Jul. 15, 2020
Asml Netherlands B.v., Veldhoven, NL;
Marc Hauptmann, Turnhout, BE;
Cornelis Johannes Henricus Lambregts, Geldrop, NL;
Amir Bin Ismail, Eindhoven, NL;
Rizvi Rahman, Eindhoven, NL;
Allwyn Boustheen, Eindhoven, NL;
Raheleh Pishkari, Eindhoven, NL;
Everhardus Cornelis Mos, Best, NL;
Ekaterina Mikhailovna Viatkina, Eindhoven, NL;
Roy Werkman, Eindhoven, NL;
Ralph Brinkhof, Vught, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of controlling a semiconductor manufacturing process, the method including: obtaining first metrology data based on measurements performed after a first process step; obtaining second metrology data based on measurements performed after the first process step and at least one additional process step; estimating a contribution to the process of: a) a control action which is at least partially based on the second metrology data and/or b) the at least one additional process step by using at least partially the second metrology data; and determining a Key Performance Indicator (KPI) or a correction for the first process step using the first metrology data and the estimated contribution.