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For the Inventor, By the Inventor

Vught, Netherlands

Ralph Brinkhof

USPTO Granted Patents = 20 

 

Average Co-Inventor Count = 5.7

ph-index = 5

Forward Citations = 46(Granted Patents)


Location History:

  • Eindhoven, NL (2006 - 2011)
  • 's-Hertogenbosch, NL (2012 - 2014)
  • Vught, NL (2019 - 2024)

Company Filing History:

goldMedal20 out of 4,892 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 618 
 
Asml Holding N.v.
 patents
where one patent can have more than one assignee

Years Active: 2006-2025

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20 patents (USPTO):Explore Patents
1. 12276919 - Method for controlling a semiconductor manufacturing process (2025-04-14),
2. 12189314 - Metrology method and associated metrology and lithographic apparatuses (2025-01-07),
3. 12032299 - Metrology method and associated metrology and lithographic apparatuses (2024-07-09),
4. 11442372 - Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic tool (2022-09-13),
5. 11029610 - Lithographic method (2021-06-08),
6. 10962887 - Lithographic method (2021-03-30),
7. 10901326 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2021-01-26),
8. 10620549 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2020-04-14),
9. 10527958 - Lithographic method (2020-01-07),
10. 10416577 - Position measuring method of an alignment target (2019-09-17),
11. 10331040 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2019-06-25),
12. 8842293 - Level sensor arrangement for lithographic apparatus and device manufacturing method (2014-09-23),
13. 8675210 - Level sensor, lithographic apparatus, and substrate surface positioning method (2014-03-18),
14. 8208118 - Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier (2012-06-26),
15. 7889357 - Method for positioning a target portion of a substrate with respect to a focal plane of a projection system (2011-02-15),

Title: The Innovative Journey of Inventor Ralph Brinkhof

Introduction: Ralph Brinkhof, a talented inventor hailing from Vught, Netherlands, has made significant contributions to the world of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Ralph Brinkhof's latest patents showcase his expertise in various fields, including technology, engineering, and design. His recent inventions have been recognized for their ingenuity and practicality in addressing modern challenges.

Career Highlights: Throughout his career, Ralph Brinkhof has demonstrated a remarkable ability to transform ideas into tangible inventions. His passion for innovation has led to the development of groundbreaking solutions that have improved the lives of many.

Collaborations: Ralph Brinkhof has collaborated with leading companies, research institutions, and fellow inventors to bring his ideas to life. These partnerships have been instrumental in turning his concepts into successful products that have made a positive impact on society.

Conclusion: In conclusion, Ralph Brinkhof's journey as an inventor is a testament to his creativity, perseverance, and commitment to pushing the boundaries of what is possible. His innovative spirit continues to inspire others in the field of inventions and beyond.

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