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For the Inventor, By the Inventor

Vught, Netherlands

Ralph Brinkhof

This inventor holds 21 USPTO granted patents and 3 published patent applications and 3 EPO patents, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralph Brinkhof. Retrieved from https://idiyas.com/inventor/ralph-brinkhof

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 95.2

 

Average Co-Inventor Count = 5.6

ph-index = 5

Forward Citations = 52(Granted Patents)


Location History:

  • Eindhoven, NL (2006 - 2011)
  • 's-Hertogenbosch, NL (2012 - 2014)
  • Vught, NL (2019 - 2024)

Company Filing History:

goldMedal21 out of 5,075 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 630 
 
Asml Holding N.v.
 patents
where one patent can have more than one assignee

Years Active: 2006-2026

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Areas of Expertise:
Lithographic Apparatus
Metrology Method
Semiconductor Manufacturing
Alignment System
Position Measuring
Exposure Settings
Substrate Surface
Control System
Level Sensor
Measurement Data
Device Manufacturing
Focal Plane
21 patents (USPTO):Explore Patents
1. 12619159 - Method for modeling measurement data over a substrate area and associated apparatuses (2026-05-05),
2. 12276919 - Method for controlling a semiconductor manufacturing process (2025-04-14),
3. 12189314 - Metrology method and associated metrology and lithographic apparatuses (2025-01-07),
4. 12032299 - Metrology method and associated metrology and lithographic apparatuses (2024-07-09),
5. 11442372 - Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic tool (2022-09-13),
6. 11029610 - Lithographic method (2021-06-08),
7. 10962887 - Lithographic method (2021-03-30),
8. 10901326 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2021-01-26),
9. 10620549 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2020-04-14),
10. 10527958 - Lithographic method (2020-01-07),
11. 10416577 - Position measuring method of an alignment target (2019-09-17),
12. 10331040 - Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2019-06-25),
13. 8842293 - Level sensor arrangement for lithographic apparatus and device manufacturing method (2014-09-23),
14. 8675210 - Level sensor, lithographic apparatus, and substrate surface positioning method (2014-03-18),
15. 8208118 - Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier (2012-06-26),

Title: The Innovative Journey of Inventor Ralph Brinkhof

Introduction: Ralph Brinkhof, a talented inventor hailing from Vught, Netherlands, has made significant contributions to the world of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Ralph Brinkhof's latest patents showcase his expertise in various fields, including technology, engineering, and design. His recent inventions have been recognized for their ingenuity and practicality in addressing modern challenges.

Career Highlights: Throughout his career, Ralph Brinkhof has demonstrated a remarkable ability to transform ideas into tangible inventions. His passion for innovation has led to the development of groundbreaking solutions that have improved the lives of many.

Collaborations: Ralph Brinkhof has collaborated with leading companies, research institutions, and fellow inventors to bring his ideas to life. These partnerships have been instrumental in turning his concepts into successful products that have made a positive impact on society.

Conclusion: In conclusion, Ralph Brinkhof's journey as an inventor is a testament to his creativity, perseverance, and commitment to pushing the boundaries of what is possible. His innovative spirit continues to inspire others in the field of inventions and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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