The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Nov. 18, 2019
Asml Netherlands B.v., Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Edo Maria Hulsebos, Waalre, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Sudharshanan Raghunathan, Fremont, CA (US);
Boris Menchtchikov, Redwood City, CA (US);
Ahmet Koray Erdamar, Eindhoven, NL;
Loek Johannes Petrus Verhees, Reusel, NL;
Willem Seine Christian Roelofs, Deurne, NL;
Wendy Johanna Martina Van De Ven, Heesch, NL;
Hadi Yagubizade, Eindhoven, NL;
Hakki Ergün Cekli, Singapore, SG;
Ralph Brinkhof, Vught, NL;
Tran Thanh Thuy Vu, Eindhoven, NL;
Maikel Robert Goosen, Eindhoven, NL;
Maaike Van't Westeinde, Veldhoven, NL;
Weitian Kou, Eindhoven, NL;
Manouk Rijpstra, Eindhoven, NL;
Matthijs Cox, Valeknswaard, NL;
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method including: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.