IDiyas

For the Inventor, By the Inventor

Deurne, Netherlands

Willem Seine Christian Roelofs

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 12.3

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Duerne, NL (2021)
  • Deurne, NL (2020 - 2023)

Company Filing History:

goldMedal10 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2020-2023

Loading Chart...
Loading Chart...
10 patents (USPTO):
1. 11782349 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2023-10-10),
2. 11774862 - Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus (2023-10-03),
3. 11592753 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2023-02-28),
4. 11327407 - Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus (2022-05-10),
5. 11175591 - Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus (2021-11-16),
6. 11126093 - Focus and overlay improvement by modifying a patterning device (2021-09-21),
7. 11029610 - Lithographic method (2021-06-08),
8. 10962887 - Lithographic method (2021-03-30),
9. 10877381 - Methods of determining corrections for a patterning process (2020-12-29),
10. 10527958 - Lithographic method (2020-01-07),

Title: Willem Seine Christian Roelofs: Pioneering Innovations in Lithography

Introduction:

Willem Seine Christian Roelofs, a visionary inventor hailing from Deurne, NL, is a trailblazer in the realm of inventions. With an impressive portfolio of 10 patents to his name, he has been instrumental in revolutionizing lithographic processes.

Latest Patents:

Roelofs' latest patents showcase his expertise in lithography:

1. Methods of determining corrections for a patterning process

2. Device manufacturing method

3. Control system for a lithographic apparatus

4. Lithographic apparatus

Career Highlights:

Roelofs has made significant contributions to the field of lithography. His innovative methods for determining corrections in the patterning process have streamlined device manufacturing and improved the control systems of lithographic apparatus. His dedication to precision and efficiency is evident in each patent he holds.

Collaborations:

Roelofs has collaborated with esteemed colleagues such as Hakki Ergün Cekli and Weitian Kou at ASML Netherlands B.V. These collaborations have fostered a culture of innovation, leading to groundbreaking advancements in lithography and device manufacturing.

Conclusion:

Willem Seine Christian Roelofs' indomitable spirit of innovation and relentless pursuit of excellence have established him as a beacon of inspiration in the world of inventions. His pioneering work in lithography continues to shape a better future, setting new standards for precision and efficiency in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…