The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
May. 17, 2017
Asml Netherlands B.v., Veldhoven, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Reiner Maria Jungblut, Eindhoven, NL;
Leon Paul Van Dijk, Eindhoven, NL;
Willem Seine Christian Roelofs, Deurne, NL;
Wim Tjibbo Tel, Helmond, NL;
Stefan Hunsche, Santa Clara, CA (US);
Maurits Van Der Schaar, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method is proposed involving obtaining data regarding an expected focus offset during a patterning process due to topography of a region of a substrate surface. A modification of, e.g., a transmission or reflection of a region of a patterning device associated with the region of the substrate surface is determined based on the data. Using the patterning device modified according the determined modification during the patterning process mitigates an impact of the substrate topography on a parameter of the patterning process.