Company Filing History:

15 out of 4,883

Asml Netherlands B.v.

patents

1 out of 14,087

U.S. Philips Corporation

patents

1 out of 1

Asnl Netherlands B.v.

patent

Years Active: 2000-2025

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17 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12189302 - Computational metrology (2025-01-07),

2. 11347150 - Computational metrology (2022-05-31),

3. 11126093 - Focus and overlay improvement by modifying a patterning device (2021-09-21),

4. 10996176 - Methods and apparatus for measuring a property of a substrate (2021-05-04),

5. 10990018 - Computational metrology (2021-04-27),

6. 10746668 - Methods and apparatus for measuring a property of a substrate (2020-08-18),

7. 10558130 - Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method (2020-02-11),

8. 10545410 - Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product (2020-01-28),

9. 10324379 - Lithographic apparatus and method (2019-06-18),

10. 10317191 - Methods and apparatus for measuring a property of a substrate (2019-06-11),

11. 10274849 - Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method (2019-04-30),

12. 10133191 - Method for determining a process window for a lithographic process, associated apparatuses and a computer program (2018-11-20),

13. 9594029 - Methods and apparatus for measuring a property of a substrate (2017-03-14),

14. 9217916 - Lithographic apparatus and device manufacturing method (2015-12-22),

15. 8263296 - Lithographic apparatus and device manufacturing method (2012-09-11),

Title: Reiner Maria Jungblut: Champion of Innovation in Eindhoven

Introduction:

In the bustling city of Eindhoven, NL, one man stands out in the world of inventors - Reiner Maria Jungblut. With a passion for innovation and a relentless pursuit of excellence, Jungblut has solidified his position as a prominent figure shaping the future of technology and science.

Latest Patents:

With an impressive portfolio of 16 patents, Jungblut's latest creations include groundbreaking inventions in computational metrology and focus and overlay improvement. His method in computational metrology involves determining distributions of parameters associated with errors in device manufacturing processes, ultimately enhancing efficiency and accuracy. Additionally, his innovative approach to focus and overlay improvement by modifying patterning devices mitigates the impact of substrate topography on the patterning process, revolutionizing precision in technology.

Career Highlights:

Having worked with renowned companies such as ASML Netherlands B.V. and U.S. Philips Corporation, Jungblut has left an indelible mark on the industry. His contributions have significantly advanced the fields of metrology and semiconductor technology, earning him acclaim among peers and experts alike.

Collaborations:

Throughout his career, Jungblut has collaborated with esteemed colleagues such as Everhardus Cornelis Mos and Wim Tjibbo Tel, pooling their expertise to drive innovation and progress in their respective fields. Together, they have paved the way for cutting-edge solutions and transformative technologies.

Conclusion:

In conclusion, Reiner Maria Jungblut's unwavering dedication to innovation and his remarkable inventions underscore his importance in the world of inventors. His visionary work continues to inspire and shape the landscape of technology, promising a future fueled by creativity and ingenuity.

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