The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Feb. 07, 2017
Asml Netherlands B.v., Veldhoven, NL;
Hakki Ergun Cekli, Singapore, SG;
Masashi Ishibashi, Eindhoven, NL;
Leon Paul Van Dijk, Eindhoven, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Xing Lan Liu, Ukkel, BE;
Reiner Maria Jungblut, Eindhoven, NL;
Cedric Marc Affentauschegg, Leende, NL;
Ronald Henricus Johannes Otten, Rosemalen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic process includes clamping a substrate onto a substrate support, measuring positions across the clamped substrate, and applying a pattern to the clamped substrate using the positions measured. A correction is applied to the positioning of the applied pattern in localized regions of the substrate, based on recognition of a warp-induced characteristic in the positions measured across the substrate. The correction may be generated by inferring one or more shape characteristics of the warped substrate using the measured positions and other information. Based on the one or more inferred shape characteristics, a clamping model is applied to simulate deformation of the warped substrate in response to clamping. A correction is calculated based on the simulated deformation.