Rosmalen, Netherlands

Ronald Henricus Johannes Otten

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Rosemalen, NL (2020)
  • Rosmalen, NL (2022)

Company Filing History:


Years Active: 2020-2022

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Certainly! Here is an article about inventor Ronald Henricus Johannes Otten:

Title: Innovator Spotlight: Ronald Henricus Johannes Otten

Introduction: Ronald Henricus Johannes Otten is a prolific inventor based in Rosmalen, Netherlands. With a notable portfolio of 4 patents, Otten has made significant contributions to the field of metrology and lithography.

Latest Patents:

1. Methods of determining stress in a substrate: Otten's innovative method involves determining stress in a substrate by analyzing position differences between features on the substrate. This approach allows for the accurate assessment of local stress levels.

2. Control system for controlling a lithographic process: Otten's patented control system enhances precision in lithographic processes, thereby improving overall output quality.

3. Lithographic apparatus and computer program product: Otten's method and control system for determining stress in a substrate have revolutionized the way stress is measured and managed in industrial processes.

4. Metrology apparatus: Otten’s advanced metrology apparatus enables the precise determination of in-plane distortion across substrates with patterned regions. This technology has applications in various industries requiring high accuracy and quality control.

Career Highlights: Ronald Henricus Johannes Otten is affiliated with ASML Netherlands B.V., a leading technology company specializing in photolithography equipment for the semiconductor industry. His expertise and patented inventions have played a significant role in ASML's technological advancements.

Collaborations: Otten has collaborated with esteemed colleagues such as Leon Paul Van Dijk and Richard Johannes Franciscus Van Haren. Together, they have contributed to cutting-edge innovations in the field of metrology and lithography.

Conclusion: Ronald Henricus Johannes Otten's passion for innovation and commitment to technological advancement have established him as a key figure in the field of metrology and lithography. His patents reflect a dedication to precision and quality, and his collaborations with industry experts ensure a promising future of groundbreaking inventions.

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