The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Jul. 03, 2019
Asml Netherlands B.v., Veldhoven, NL;
Leon Paul Van Dijk, Eindhoven, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
Subodh Singh, Eindhoven, NL;
Ilya Malakhovsky, Eindhoven, NL;
Ronald Henricus Johannes Otten, Rosmalen, NL;
Amandev Singh, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.