Company Filing History:

6 out of 4,883

Asml Netherlands B.v.

patents

Years Active: 2017-2022

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11300889 - Metrology apparatus (2022-04-12),

2. 10534274 - Method of inspecting a substrate, metrology apparatus, and lithographic system (2020-01-14),

3. 10437159 - Measurement system, lithographic system, and method of measuring a target (2019-10-08),

4. 9921489 - Focus monitoring arrangement and inspection apparatus including such an arrangement (2018-03-20),

5. 9786044 - Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method (2017-10-10),

6. 9753379 - Inspection apparatus and methods, methods of manufacturing devices (2017-09-05),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I'll craft an article about inventor Amandev Singh based on the data you provided.

Title: Unveiling the Innovations of Amandev Singh: Leading the way in Metrology Advancements

Introduction:

Amandev Singh, a distinguished inventor hailing from Eindhoven, NL, has truly made his mark in the field of metrology with a total of six patents to his name. His groundbreaking work in determining in-plane distortion (IPD) across substrates has revolutionized the industry, with his latest patents showcasing his exceptional expertise in the domain. Let's delve deeper into the world of Amandev Singh and his contributions.

Latest Patents:

Singh's latest patents encompass cutting-edge methods and apparatuses for determining IPD across substrates with patterned regions. His focus on obtaining intra-region data indicative of local stress distributions, and subsequently determining global stress distributions across the substrate, highlights his commitment to precision and accuracy in metrology practices.

Career Highlights:

Currently associated with ASML Netherlands B.V., Amandev Singh's role in the organization has been pivotal in driving forward innovations in metrology technologies. His relentless pursuit of excellence and his ability to push boundaries have set him apart as a visionary in the industry, leading the way for advancements in substrate inspection and lithographic systems.

Collaborations:

In his professional journey, Amandev Singh has collaborated with notable individuals such as Henricus Petrus Maria Pellemans and Teunis Willem Tukker. These collaborations have not only enriched his work but have also paved the way for groundbreaking advancements in metrology technologies, showcasing the power of teamwork in driving innovation.

Conclusion:

In conclusion, Amandev Singh stands as a beacon of innovation in the field of metrology, with his patents and contributions shaping the future of substrate inspection methodologies. His collaborative spirit and unwavering dedication to his craft have solidified his position as a trailblazer in the industry, with his work continuing to inspire and advance the realms of metrology and beyond.

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