The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Feb. 07, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Richard Johannes Franciscus Van Haren, Waalre, NL;
Leon Paul Van Dijk, Eindhoven, NL;
Ilya Malakhovsky, Eindhoven, NL;
Ronald Henricus Johannes Otten, Rosmalen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70783 (2013.01); G03F 7/70525 (2013.01); G03F 7/70625 (2013.01); G03F 9/7003 (2013.01);
Abstract
A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.