The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Feb. 17, 2010
Paul Christiaan Hinnen, Veldhoven, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Reiner Maria Jungblut, Taipei, TW;
Koenraad Remi André Maria Schreel, Veldhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Reiner Maria Jungblut, Taipei, TW;
Koenraad Remi André Maria Schreel, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.