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Veldhoven, Netherlands

Paul Christiaan Hinnen

This inventor holds 53 USPTO granted patents and 8 published patent applications and 3 EPO patents, primarily in Lithographic Metrology. Top assignee: Asml Netherlands B.v.. Active years: 2007-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Christiaan Hinnen. Retrieved from https://idiyas.com/inventor/paul-christiaan-hinnen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 53 

% Patents Active = 92.5

 

Average Co-Inventor Count = 5.8

ph-index = 8

Forward Citations = 180(Granted Patents)

Forward Citations (Not Self Cited) = 133(Dec 10, 2025)


Company Filing History:

goldMedal53 out of 5,087 
 
Asml Netherlands B.v.
 patents

Years Active: 2007-2025

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Areas of Expertise:
Patterning Process
Metrology Data
Lithographic Apparatus
Focus Performance
Image Plane Detection
Calibration Techniques
Process Monitoring
Error Reduction
Geometric Symmetry
Device Manufacturing
Inspection Method
Substrate
53 patents (USPTO):Explore Patents
1. 12468235 - Method and apparatus to determine a patterning process parameter (2025-11-11),
2. 12468234 - Method of controlling a patterning process, device manufacturing method (2025-11-11),
3. 12322660 - Method and apparatus to determine a patterning process parameter (2025-06-03),
4. 12142535 - Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry (2024-11-12),
5. 11947269 - Method and apparatus to determine a patterning process parameter (2024-04-02),
6. 11784098 - Method and apparatus to determine a patterning process parameter (2023-10-10),
7. 11733610 - Method and system to monitor a process apparatus (2023-08-22),
8. 11728224 - Method and apparatus to determine a patterning process parameter (2023-08-15),
9. 11710668 - Method and apparatus to determine a patterning process parameter (2023-07-25),
10. 11604419 - Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets (2023-03-14),
11. 11520239 - Separation of contributions to metrology data (2022-12-06),
12. 11385553 - Metrology method, patterning device, apparatus and computer program (2022-07-12),
13. 11314174 - Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method (2022-04-26),
14. 11145557 - Method and apparatus to determine a patterning process parameter (2021-10-12),
15. 11143972 - Method and apparatus to determine a patterning process parameter (2021-10-12),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can provide you with information about inventor Paul Christiaan Hinnen.

Title: The Innovations of Paul Christiaan Hinnen

Introduction: Paul Christiaan Hinnen is a prolific inventor based in Veldhoven, Netherlands, known for his remarkable contributions to the field of patterning process parameters. With an impressive portfolio of 49 patents, Hinnen has made significant strides in the realm of optical characteristic distributions and measurement recipes.

Latest Patents: Hinnen's latest patents showcase his expertise in determining patterning process parameters. One of his innovations involves a method and apparatus to determine a patterning process parameter by analyzing the physical configurations of structures on a substrate. Another patent focuses on determining overlay in a patterning process by utilizing optical characteristic values from detected radiation representations.

Career Highlights: Paul Christiaan Hinnen is a key figure at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML has been pivotal in advancing technology related to patterning processes, contributing to the company's reputation for innovation and excellence in the field.

Collaborations: Hinnen has collaborated with notable colleagues such as Hugo Augustinus Joseph Cramer and Anagnostis Tsiatmas. Together, they have worked on cutting-edge projects that have paved the way for new developments in the semiconductor industry.

Conclusion: Paul Christiaan Hinnen's dedication to innovation and his groundbreaking work in the field of patterning process parameters have established him as a visionary inventor. His patents and collaborations stand as a testament to his expertise and invaluable contributions to the technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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