The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2022
Filed:
Aug. 03, 2018
Asml Netherlands B.v., Veldhoven, NL;
Laurentius Cornelius De Winter, Vessem, NL;
Roland Pieter Stolk, Sprang-Capelle, NL;
Frank Staals, Eindhoven, NL;
Anton Bernhard Van Oosten, Lommel, BE;
Paul Christiaan Hinnen, Veldhoven, NL;
Marinus Jochemsen, Veldhoven, NL;
Thomas Theeuwes, Veldhoven, NL;
Eelco Van Setten, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.