Vessem, Netherlands

Laurentius Cornelius De Winter


 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2007-2025

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21 patents (USPTO):

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I will provide you with a detailed article about inventor Laurentius Cornelius De Winter based on the data you provided.

Title: Innovator Spotlight: Laurentius Cornelius De Winter

Introduction:

Laurentius Cornelius De Winter is a prolific inventor hailing from Vessem, Netherlands, with an impressive portfolio of 19 patents to his name. His groundbreaking work in the field of lithographic apparatus has cemented his reputation as a visionary in the industry.

Latest Patents:

De Winter's latest patents showcase his expertise in methods and patterning devices for measuring the focus performance of a lithographic apparatus. These inventions involve a method of measuring focus performance by printing different structures with varying non-telecentricity illuminations, ultimately leading to a more precise measurement of focus performance and patterning device that reflects incident radiation with precision.

Career Highlights:

De Winter is currently associated with ASML Netherlands B.V., a leading company in the field of lithography. His innovative contributions have not only expanded the company's intellectual property portfolio but have also pushed the boundaries of technological advancements in the industry.

Collaborations:

Throughout his career, De Winter has worked alongside esteemed colleagues such as Jozef Maria Finders and Marcus Adrianus Van De Kerkhof. Their collaborations have led to the development of cutting-edge technologies that have revolutionized the field of lithographic apparatus.

Conclusion:

In conclusion, Laurentius Cornelius De Winter's dedication to innovation and his relentless pursuit of excellence have established him as a trailblazer in the world of lithography. His numerous patents and collaborative efforts reflect his commitment to shaping the future of technology. We look forward to witnessing his continued success and contributions to the field.

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