The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Nov. 26, 2012
Peter David Engblom, Meridian, ID (US);
Carsten Andreas Köhler, Veldhoven, NL;
Frank Staals, Eindhoven, NL;
Laurentius Cornelius DE Winter, Vessem, NL;
Peter David Engblom, Meridian, ID (US);
Carsten Andreas Köhler, Veldhoven, NL;
Frank Staals, Eindhoven, NL;
Laurentius Cornelius De Winter, Vessem, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.