Frank Staals

This inventor holds 59 USPTO granted patents and 4 published patent applications and 3 EPO patents, primarily in Lithographic Metrology (CPC class G03F). Top assignee: Asml Netherlands B.v.. Active years: 2006-2026.

USPTO Granted Patents = 59 (Patent Applications = 4)

% Patents Active = 79.7

EPO Patents = 3 (Patent Applications = 22)

Average Co-Inventor Count = 3.8

ph-index = 5

Forward Citations = 82(Granted Patents)

Forward Citations (Not Self Cited) = 64(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

59 out of 5,070

Asml Netherlands B.v.

patents

Years Active: 2006-2026

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Areas of Expertise:

Lithographic Apparatus

Metrology

Focus Performance

Process Optimization

Device Manufacturing

Wavefront Optimization

Measurement Method

Control Parameters

Patterning Devices

Inspection Apparatus

Calibration

Topographical Variation

59 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12619161 - Method for inferring a processing parameter such as focus and associated apparatuses and manufacturing method (2026-05-05),

2. 12461451 - Computational metrology (2025-11-04),

3. 12346031 - Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method (2025-07-01),

4. 12287582 - Method for controlling a lithographic apparatus and associated apparatuses (2025-04-29),

5. 12197136 - Method of determining control parameters of a device manufacturing process (2025-01-14),

6. 12112260 - Metrology apparatus and method for determining a characteristic of one or more structures on a substrate (2024-10-08),

7. 12050406 - Method for controlling a lithographic apparatus and associated apparatuses (2024-07-30),

8. 11977334 - Wavefront optimization for tuning scanner based on performance matching (2024-05-07),

9. 11768442 - Method of determining control parameters of a device manufacturing process (2023-09-26),

10. 11733615 - Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method (2023-08-22),

11. 11733610 - Method and system to monitor a process apparatus (2023-08-22),

12. 11586114 - Wavefront optimization for tuning scanner based on performance matching (2023-02-21),

13. 11520239 - Separation of contributions to metrology data (2022-12-06),

14. 11513442 - Method of determining control parameters of a device manufacturing process (2022-11-29),

15. 11487209 - Method for controlling a lithographic apparatus and associated apparatuses (2022-11-01),

Certainly! Here is the article about inventor Frank Staals:

Title: The Innovative Mind of Frank Staals

Introduction:

Frank Staals, a prolific inventor based in Eindhoven, Netherlands, is renowned for his exceptional contributions to the field of lithography with a staggering number of 53 patents under his belt.

Latest Patents:

1. Method for controlling a lithographic apparatus and associated apparatuses: Frank's method revolutionizes lithographic processes by optimizing control of the apparatus based on substrate-specific metrology data and performance parameters.

2. Wavefront optimization for tuning scanner based on performance matching: This patent highlights Frank's ingenuity in determining wavefront parameters crucial for enhancing the performance of patterning processes.

Career Highlights:

At the forefront of innovation, Frank Staals is a distinguished member of the renowned company ASML Netherlands B.V., a global leader in semiconductor manufacturing equipment. His groundbreaking ideas have significantly impacted the technological landscape, particularly in lithography.

Collaborations:

In his pursuit of excellence, Frank collaborates closely with esteemed coworkers such as Wim Tjibbo Tel and Paul Christiaan Hinnen. Together, they form a dynamic team driving advancements in the intricate realm of lithographic processes.

Conclusion:

In conclusion, Frank Staals stands as a shining example of a visionary inventor whose relentless pursuit of innovation continues to shape the future of lithography. His remarkable patents and collaborations underscore his profound impact on the industry, solidifying his legacy as a trailblazer in the world of technology.