The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Aug. 22, 2018
Asml Netherlands B.v., Veldhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Mark John Maslow, Eindhoven, NL;
Koenraad Van Ingen Schenau, Veldhoven, NL;
Patrick Warnaar, Tilburg, NL;
Abraham Slachter, Waalre, NL;
Roy Anunciado, Eindhoven, NL;
Simon Hendrik Celine Van Gorp, Oud-Turnhout, BE;
Frank Staals, Eindhoven, NL;
Marinus Jochemsen, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.