Tilburg, Netherlands

Patrick Warnaar

USPTO Granted Patents = 51 

 

Average Co-Inventor Count = 4.1

ph-index = 5

Forward Citations = 163(Granted Patents)

DiyaCoin DiyaCoin 0.29 


Company Filing History:


Years Active: 2011-2025

where 'Filed Patents' based on already Granted Patents

51 patents (USPTO):

Title: Innovator Spotlight - Patrick Warnaar

Introduction:

Patrick Warnaar, a prolific inventor based in Tilburg, Netherlands, has made significant contributions to the field of lithographic processes through his groundbreaking innovations. With an impressive portfolio of 43 patents, Warnaar's work has had a profound impact on the advancement of metrology systems and methodologies in the semiconductor industry.

Latest Patents:

Among Warnaar's latest patents is the "Target for measuring a parameter of a lithographic process," which revolutionizes the way performance parameters are determined in lithography. This target consists of intricate sub-targets with overlapping gratings, enabling precise measurements essential for enhancing lithographic processes. Additionally, his patent on the "Metrology system and method for determining a characteristic of one or more structures on a substrate" showcases his expertise in developing advanced systems for characterizing substrate structures with unparalleled accuracy.

Career Highlights:

Throughout his career, Warnaar has held key positions at renowned companies in the semiconductor industry, including ASML Netherlands B.V. and ASML Holding N.V. (ASML). His innovative spirit and dedication to pushing the boundaries of technology have solidified his reputation as a pioneering figure in the field of lithography.

Collaborations:

Collaborating with talented individuals is a hallmark of Warnaar's innovative approach. Among his notable coworkers are Maurits Van Der Schaar and Hendrik Jan Hidde Smilde, who have worked alongside him to further refine and implement his groundbreaking ideas. Together, they have paved the way for cutting-edge advancements in metrology and semiconductor manufacturing.

Conclusion:

In conclusion, Patrick Warnaar stands out as a visionary inventor who continues to shape the future of lithography with his unparalleled creativity and expertise. His impressive patent portfolio and collaborative efforts underscore his invaluable contributions to the semiconductor industry, making him a driving force behind the evolution of metrology systems and processes.

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