The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Jun. 08, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Maurits Van Der Schaar, Eindhoven, NL;
Patrick Warnaar, Tilburg, NL;
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
Olger Victor Zwier, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70683 (2013.01); G03F 7/70633 (2013.01);
Abstract
Disclosed is target arrangement comprising a first target region having at least a first pitch and at least a second pitch a second target region having at least a third pitch, wherein a portion of the first target region having a second pitch overlaps with a portion of the second target region.
Quick Actions:
Van Der Schaar, Maurits. (2025). Target for measuring a parameter of a lithographic process (U.S. Patent No. 12242203). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12242203
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile