The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Aug. 03, 2023
Asml Netherlands B.v., Veldhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Mark John Maslow, Eindhoven, NL;
Koenraad Van Ingen Schenau, Veldhoven, NL;
Patrick Warnaar, Tilburg, NL;
Abraham Slachter, Waalre, NL;
Roy Anunciado, Eindhoven, NL;
Simon Hendrik Celine Van Gorp, Oud-Turnhout, BE;
Frank Staals, Eindhoven, NL;
Marinus Jochemsen, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature manufactured on the substrate by a manufacturing process including a lithographic process and one or more further processes; determining one or more image-related metrics in dependence on a contour determined from the image, wherein one of the one or more image-related metrics is an edge placement error, EPE, of the at least one feature; and determining one or more control parameters of the lithographic process and/or the one or more further processes in dependence on the edge placement error, wherein at least one control parameter is determined so as to minimize the edge placement error of the at least one feature.