The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
May. 29, 2019
Asml Netherlands B.v., Veldhoven, NL;
Lorenzo Tripodi, Eindhoven, NL;
Patrick Warnaar, Tilburg, NL;
Grzegorz Grzela, Eindhoven, NL;
Mohammadreza Hajiahmadi, Rotterdam, NL;
Farzad Farhadzadeh, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Adrianus Cornelis Matheus Koopman, Hilversum, NL;
Frank Staals, Eindhoven, NL;
Brennan Peterson, Longmont, CO (US);
Anton Bernhard Van Oosten, Lommel, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.