Joetsu, Japan

Jun Hatakeyama

Average Co-Inventor Count = 2.6

ph-index = 27

Forward Citations = 3,158(Granted Patents)

Forward Citations (Not Self Cited) = 1,978(Sep 21, 2024)

DiyaCoin DiyaCoin 6.93 

Inventors with similar research interests:


Location History:

  • Gunma, JP (1991)
  • Tsukuba, JP (1992)
  • Ibaraki, JP (1991 - 1994)
  • Usui-gun, JP (1996)
  • Annaka, JP (1991 - 1998)
  • Kubiki-mura, JP (2003 - 2004)
  • Nakakubiki-gun, JP (1998 - 2006)
  • Niigata-ken, JP (2000 - 2009)
  • Kubili-mura, JP (2010)
  • Niigata, JP (2007 - 2016)
  • Joestu, JP (2016)
  • Joetsu, JP (2007 - 2024)
  • Jyoetsu, JP (2012 - 2024)


Years Active: 1991-2025

where 'Filed Patents' based on already Granted Patents

547 patents (USPTO):

Title: Jun Hatakeyama: Pioneering Innovations for Antireflective Films and Resist Composition

Introduction:

Jun Hatakeyama, a prominent inventor hailing from Joetsu, Japan, has made significant contributions in the field of materials science and optical technology. With 503 patents under his belt, Hatakeyama's expertise lies in developing innovative solutions for antireflective films and resist compositions. In this article, we delve into his latest patents, career highlights, collaborations, and shed light on the remarkable impact he has had in his field.

Latest Patents:

Hatakeyama's recent patents demonstrate his profound understanding of antireflective films, photoresist materials, and displays. His groundbreaking patent titled "Antireflective film including a photoresist material containing a polymer compound having an aromatic group, method of producing antireflective film, and eyeglass type display" showcases an antireflective film that reduces light reflection. The patent also discloses a novel method of production and its application in eyeglass type displays, making it a significant advancement in optical technology.

Another noteworthy patent is Hatakeyama's "Resist composition and patterning process" invention. This patent focuses on a resist composition comprising a base polymer and a quencher, offering high sensitivity and improved critical dimension uniformity (CDU). The resist composition works independently of its tone, whether positive or negative, making it an essential breakthrough in lithography processes.

Career Highlights:

Jun Hatakeyama's notable career spans across renowned companies in the chemical and glass industries. He has contributed extensively to the advancement of materials science and technology at Shin-Etsu Chemical Co., Ltd. and Central Glass Company Limited, both distinguished organizations known for their innovative contributions in the field.

Collaborations:

Throughout his career, Hatakeyama has worked closely with talented individuals who complement his expertise. Notable colleagues who have collaborated with him include Koji Hasegawa and Masaki Ohashi. Their collaborative efforts have led to numerous technological breakthroughs and patent filings, further strengthening Hatakeyama's contributions to the field.

Conclusion:

Jun Hatakeyama has emerged as an exceptional inventor with a keen focus on materials science and optical technology. His extensive patent portfolio and groundbreaking inventions in the areas of antireflective films and resist compositions have revolutionized the field. Hatakeyama's collaboration with renowned companies and talented colleagues showcases his ability to work as part of a team to deliver cutting-edge innovations. As a visionary in his field, Hatakeyama's impact will continue to shape the future of optical technology and materials science.

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