The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Oct. 13, 2022
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventor:

Jun Hatakeyama, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 211/62 (2006.01); C07C 211/63 (2006.01); C07C 211/64 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 211/62 (2013.01); C07C 211/63 (2013.01); C07C 211/64 (2013.01); C08F 212/24 (2020.02); C08F 220/1806 (2020.02); C08F 220/1811 (2020.02); C08F 220/22 (2013.01); C08F 220/281 (2020.02); C08F 220/382 (2020.02); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C-Chydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.


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