This inventor holds 422 USPTO granted patents and 93 published patent applications and 1 EPO patent, primarily in Photoresist Technology (CPC class H01L21-0274). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Macronix International Co., Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2001-2026.
Inventors with similar research interests:
Location History:
- I Lan Hsein, TW (2002)
- Tai-Chung Hsien, TW (2003)
- Ilai, TW (2004 - 2005)
- Yilan Hsien, TW (2001 - 2006)
- I Lan Hsien, TW (2001 - 2009)
- Ilan, TW (2002 - 2009)
- Yilang, TW (2008 - 2014)
- Yuansan Village, TW (2014)
- Yuansuan Village, Yilang County, TW (2015)
- Yuanshan Township, Yilan County, TW (2006 - 2018)
- Yuansun Village, Yilang County, TW (2008 - 2022)
- Tainan, TW (2018 - 2023)
- Hsinchu, TW (2004 - 2024)
- Yilang County, TW (2008 - 2024)
- Yuansun Village, TW (2012 - 2024)
- Taipei, TW (2017 - 2024)
- Yilan, TW (2021 - 2024)
- Yilan County, TW (2021 - 2024)
- Yiang County, TW (2024)
Company Filing History:
348 out of 42,759 
59 out of 3,609 
8 out of 463 
Years Active: 2001-2026
Areas of Expertise:
Title: Ching-Yu Chang: An Innovator Shaping Semiconductor Technology
Introduction:
In the realm of semiconductor technology, Ching-Yu Chang is a distinguished inventor who has contributed significantly to the field. With a wealth of experience and a remarkable portfolio of patents, Chang has helped to shape the advancement of this crucial industry. This article delves into his latest patents, career highlights, collaborations, and underscores his lasting impact on the semiconductor landscape.
Latest Patents:
Chang's most recent patents illustrate his expertise in developing efficient methods and apparatuses for patterning semiconductor devices. One notable patent is the "Method and Apparatus of Patterning a Semiconductor Device." The patent outlines a novel technique for forming a masking element via the exposure of a photoresist material to specific Ultraviolet (UV) radiations. This method enables the creation of precisely patterned resist layers, enhancing the overall manufacturing process.
Another noteworthy patent is the "Resist Dispensing System and Method of Use." This invention addresses the challenges associated with resist material dispensing on wafers. The patent offers an innovative solution utilizing a resist pump system and nozzle design, incorporating a retraction mechanism that prevents resist material residues from drying and ensures optimal dispensing accuracy.
Career Highlights:
Ching-Yu Chang has amassed an impressive portfolio, boasting a remarkable total of 351 patents. His dedication and expertise have been instrumental in driving advancements in semiconductor technology. Chang's work with Taiwan Semiconductor Manufacturing Company Ltd. (TSMC) and Macronix International Co., Ltd. have significantly impacted these industry giants, strengthening their positions as technological leaders.
Collaborations:
Throughout his career, Chang has collaborated with esteemed colleagues to achieve groundbreaking innovations. Notable among his collaborators are Chin-Hsiang Lin and An-Ren Zi, whose combined expertise has often resulted in synergistic breakthroughs. Together, they have pushed the boundaries of semiconductor technology and laid the foundation for numerous advancements in the field.
Conclusion:
Ching-Yu Chang's exceptional contributions to the semiconductor industry, exemplified by his extensive patent portfolio, have solidified his position as a revered innovator. His pioneering techniques in semiconductor device patterning and resist material dispensing showcase his deep understanding of the industry's challenges and his ability to deliver cutting-edge solutions. As semiconductor technology evolves rapidly, Chang's work continues to shape the present and future of this critical industry.