Shin-Etsu Chemical Co., Ltd.

Central Glass Company, Limited

Matsushita Electric Industrial Co., Ltd.

Other

Shin-Etsu Chemical C O., Ltd.

Samsung Electronics Co., Ltd.

Panasonic Corporation

Shin-Estu Chemical Co., Ltd.

Shin-Etsu Handotai Co., Ltd.

Shin-Etsu Chemical C., Ltd

Jun Hatakeyama

Koji Hasegawa

Masaki Ohashi

Yuji Harada

Takeru Watanabe

Takeshi Kinsho

Motoaki Iwabuchi

Seiichiro Tachibana

Tsunehiro Nishi

Yoshio Kawai

Kazuhiro Katayama

Masayoshi Sagehashi

Takayuki Nagasawa

Mutsuo Nakashima

Takayuki Fujiwara

Osamu Watanabe

Youichi Ohsawa

Masaru Sasago

Kazuhiko Maeda

Masayuki Endo

Tomohiro Kobayashi

Shinji Kishimura

Masahiro Fukushima

Jun Watanabe

Tsutomu Ogihara

Michitaka Ootani

Haruhiko Komoriya

Takanobu Takeda

Toshinobu Ishihara

Yasuyoshi Kuroda

Daisuke Kori

Takeshi Nagata

Satoru Miyazawa

Teppei Adachi

Shigehiro Nagura

Shiori Nonaka

Kenji Funatsu

Daisuke Domon

Kentaro Tsutsumi

Satoshi Watanabe

Takeshi Sasami

Masaharu Takahashi

Toshihiko Fujii

Takao Yoshihara

Joe Ikeda

Katsuya Takemura

Kazunori Maeda

Tomomi Watanabe

Masashi Iio

Kazumi Noda

Kazuhiro Yamanaka

Satoshi Shinachi

Tohru Kubota

Tatsushi Kaneko

Ichiro Kaneko

Wataru Kusaki

Junji Tsuchiya

Mitsuo Umemura

Chuanwen Lin

Hideto Kato

Keiichi Masunaga

Hyun-woo Kim

Naoki Ishibashi

Hideshi Kurihara

Keisuke Niida

Ryo Mitsui

Kentaro Kumaki

Kiyoshi Motomi

Shun Kikuchi

Kunio Itoh

Satoshi Okazaki

Motoo Fukushima

Takafumi Ueda

Hyun-Woo Kim

Yusuke Biyajima

Hiroyuki Urano

Katsuhiro Kobayashi

Tetsuya Inukai

Kazuhiro Nishikawa

Yasufumi Kubota

Naoya Inoue

Yuki Suka

Toshiaki Takahashi

Hiroshi Kanbara

Kenji Yamada

Kazuya Honda

Taku Morisawa

Naoki Kobayashi

Hiroki Nonaka

Hiroshi Kubota

Kousuke Ohyama

Terukazu Satoh

Ken-ich Takita

Hirohumi Kishita

Matsuo Nakashima

Tomohiro Kobatashi

Katshiro Kobayashi

Nishi Tsunehiro

A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Resist composition and pattern forming process

A positive resist composition is provided comprising a base polymer comprising repeat units (a) having two triple bonds and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced LWR, and improved CDU is formed therefrom.

Positive resist composition and pattern forming process

The present invention is a resist material containing a quencher, where the quencher contains a sulfonium salt of a carboxylic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop a quencher that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity, low LWR, and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.

Resist material and patterning process

A positive resist composition is provided comprising a base polymer end-capped with a group having formula (a)-1, (a)-2 or (a)-3. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Resist composition and patterning process

A bio-electrode composition contains (A) a reaction composite of a monomer having an ionic functional group and a carbon particle. The component (A) contains the carbon particle bonded to the monomer having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, and reaction composite

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C-Chydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A positive resist composition is provided comprising a base polymer end-capped with a sulfonium salt containing a carboxylate anion having a sulfide group linked thereto. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.

A resist composition comprising a base polymer and an acid generator in the form of a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with a fluorinated cyclic group and a nitro group is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A bio-electrode composition contains (A) an ionic polymer material, (B) an addition reaction-curable silicone having at least a hydrosilyl group, (C) a platinum-group catalyst, and a solvent. The bio-electrode composition has a water content of 0.2 mass % or less. The solvent includes one or more of an ether solvent, an ester solvent, and a ketone solvent each of which does not contain a hydroxy group, a carboxyl group, a nitrogen atom, or a thiol group. Thus, present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which does not leave residue on skin after attachment to and peeling from the skin; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode

A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

An object is to obtain a composition capable of: forming a uniform film even by spray coating or even when the composition is applied in the form of ink for inkjet printing; and preventing light emission from a portion other than an ITO electrode surface when the film is mounted on an organic EL device and light is emitted from the device. A conductive polymer composition contains: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by a general formula (1); HO (D) for dispersing the composite; a water-soluble organic solvent (C); and a compound (E) shown by a general formula (2). The electric conductivity of a film with a thickness of 20 to 200 nm formed from the conductive polymer composition is less than 1.00E-05 S/cm.

Conductive polymer composition, substrate, and method for producing substrate

A conductive polymer composition containing: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by the following general formula (2); HO (D) for dispersing the composite; and a water-soluble organic solvent (C). This provides a composition which has favorable filterability and film formability, and which is capable of relieving acidity and forming a conductive film with high transparency. Moreover, since the HO dispersion of the conductive polymer compound is mixed with an organic solvent, the surface tension and the contact angle are so low that leveling property on a substrate is imparted. The composition is usable in droplet-coating methods. Since an organic solvent having a higher boiling point than HO is used as the organic solvent, the composition can avoid solid content precipitation around a nozzle and solid content precipitation due to drying between ejecting the liquid material from a nozzle tip and landing on a substrate.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound consisting of a cyclic ammonium cation and an anion derived from a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

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Joetsu, Japan

Jun Hatakeyama