Shin-etsu Chemical Co., Ltd.

Central Glass Company, Limited

Matsushita Electric Industrial Co., Ltd.

Other

Shin-etsu Chemical C O., Ltd.

Samsung Electronics Co., Ltd.

Panasonic Corporation

Shin-estu Chemical Co., Ltd.

Shin-etsu Handotai Co., Ltd.

Shin-etsu Chemicla Co., Ltd.

Shin-etsu Chemical C., Ltd

Jun Hatakeyama

Koji Hasegawa

Masaki Ohashi

Yuji Harada

Takeru Watanabe

Takeshi Kinsho

Motoaki Iwabuchi

Seiichiro Tachibana

Tsunehiro Nishi

Yoshio Kawai

Kazuhiro Katayama

Masayoshi Sagehashi

Mutsuo Nakashima

Takayuki Nagasawa

Takayuki Fujiwara

Youichi Ohsawa

Masaru Sasago

Kazuhiko Maeda

Osamu Watanabe

Masayuki Endo

Tomohiro Kobayashi

Shinji Kishimura

Jun Watanabe

Masahiro Fukushima

Tsutomu Ogihara

Michitaka Ootani

Haruhiko Komoriya

Takanobu Takeda

Toshinobu Ishihara

Daisuke Kori

Yasuyoshi Kuroda

Takeshi Nagata

Satoru Miyazawa

Teppei Adachi

Shigehiro Nagura

Kenji Funatsu

Daisuke Domon

Kentaro Tsutsumi

Shiori Nonaka

Satoshi Watanabe

Takeshi Sasami

Masaharu Takahashi

Toshihiko Fujii

Takao Yoshihara

Katsuya Takemura

Kazunori Maeda

Joe Ikeda

Tomomi Watanabe

Masashi Iio

Kazumi Noda

Kazuhiro Yamanaka

Satoshi Shinachi

Tohru Kubota

Tatsushi Kaneko

Ichiro Kaneko

Wataru Kusaki

Junji Tsuchiya

Mitsuo Umemura

Chuanwen Lin

Hideto Kato

Keiichi Masunaga

Hyun-woo Kim

Naoki Ishibashi

Hideshi Kurihara

Keisuke Niida

Ryo Mitsui

Kentaro Kumaki

Kiyoshi Motomi

Kunio Itoh

Satoshi Okazaki

Motoo Fukushima

Takafumi Ueda

Hyun-Woo Kim

Yusuke Biyajima

Hiroyuki Urano

Katsuhiro Kobayashi

Tetsuya Inukai

Yasufumi Kubota

Kazuhiro Nishikawa

Yuki Suka

Naoya Inoue

Toshiaki Takahashi

Hiroshi Kanbara

Kazuya Honda

Kenji Yamada

Taku Morisawa

Naoki Kobayashi

Hiroki Nonaka

Hiroshi Kubota

Terukazu Satoh

Shun Kikuchi

Tomohiro Kobatashi

Katshiro Kobayashi

Matsuo Nakashima

Ken-ich Takita

Hirohumi Kishita

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound consisting of a cyclic ammonium cation and an anion derived from a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Resist composition and patterning process

An object is to obtain a conductive polymer composition having favorable filterability and film formability, and being capable of relieving acidity, forming a conductive film with high transparency, and imparting leveling property on a substrate, the composition being applicable in droplet-coating methods, such as spray coating and inkjet printing. The conductive polymer composition contains: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by the following general formula (1); HO (D) for dispersing the composite; and a water-soluble organic solvent (C).

Conductive polymer composition, substrate, and method for producing substrate

A bio-electrode composition contains (A) a composite of an ionic polymer material and particles. The component (A) contains the particles bonding to the polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, polymer compound, and composite

A positive resist composition comprises a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom.

Positive resist composition and pattern forming process

A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.

Negative resist composition and pattern forming process

A bio-electrode composition contains particles having surfaces with an N-carbonyl sulfonamide salt shown by the following general formula (1). Rrepresents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms and optionally having an aromatic group, ether group, or ester group, or an arylene group having 6 to 10 carbon atoms. Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and optionally has a fluorine atom. Mrepresents an ion selected from the group consisting of lithium, sodium, potassium, and silver ions. This invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and prevents significant reduction in electric conductivity even when wetted with water or dried.

Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, and silicon material particle

A positive resist composition comprising a base polymer comprising repeat units consisting of a fluorinated carboxylate, fluorinated phenoxide, fluorinated sulfonamide, fluorinated alkoxide, fluorinated 1,3-diketone, fluorinated β-keto ester or fluorinated imide anion and a nitrogen-containing cation having a tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

The resist composition includes a base polymer and a salt. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a fluorinated phenol exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

Positive resist composition and patterning process

A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at α- and/or β-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

A resist composition comprising an ammonium salt and fluorine-containing polymer comprising repeat units AU having ammonium salt structure of a carboxylic acid having an iodized or brominated aromatic ring and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.

A polyurethane contains a weakly acidic functional group having a pKa of 5 to 11. Thus, the present invention provides: a conductive paste composition for forming a stretchable conductive wire which varies slightly in electric conductivity at the time of elongation and shrinkage; and a polyurethane for providing the composition.

Polyurethane, polyurethane production method, conductive paste composition, conductive wire, and method for producing conductive wire

A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group (exclusive of iodine or bromine-substituted aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

A resist composition includes a base polymer and a quencher containing a salt compound having the formula (A): wherein mis an integer of 1 or 2, mis an integer of 1 to 3, n is an integer of 1 to 3, j is an integer of 1 to 3, k is an integer of 1 or 2, Xis iodine or bromine, and Ais a carboxylic acid anion, a sulfonimide anion free of fluorine, or a sulfonamide anion.

Resist composition and pattern forming process

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Joetsu, Japan

Jun Hatakeyama