Shin-etsu Chemical Co., Ltd.

Central Glass Company, Limited

Matsushita Electric Industrial Co., Ltd.

Other

Shin-etsu Chemical C O., Ltd.

Samsung Electronics Co., Ltd.

Panasonic Corporation

Shin-estu Chemical Co., Ltd.

Shin-etsu Handotai Co., Ltd.

Shin-etsu Chemicla Co., Ltd.

Shin-etsu Chemical C., Ltd

Jun Hatakeyama

Koji Hasegawa

Masaki Ohashi

Yuji Harada

Takeru Watanabe

Takeshi Kinsho

Motoaki Iwabuchi

Seiichiro Tachibana

Tsunehiro Nishi

Yoshio Kawai

Kazuhiro Katayama

Masayoshi Sagehashi

Mutsuo Nakashima

Takayuki Nagasawa

Takayuki Fujiwara

Osamu Watanabe

Youichi Ohsawa

Masaru Sasago

Kazuhiko Maeda

Masayuki Endo

Tomohiro Kobayashi

Shinji Kishimura

Masahiro Fukushima

Jun Watanabe

Tsutomu Ogihara

Michitaka Ootani

Haruhiko Komoriya

Takanobu Takeda

Toshinobu Ishihara

Yasuyoshi Kuroda

Daisuke Kori

Takeshi Nagata

Satoru Miyazawa

Teppei Adachi

Shigehiro Nagura

Kenji Funatsu

Shiori Nonaka

Daisuke Domon

Kentaro Tsutsumi

Satoshi Watanabe

Takeshi Sasami

Masaharu Takahashi

Toshihiko Fujii

Takao Yoshihara

Joe Ikeda

Katsuya Takemura

Kazunori Maeda

Tomomi Watanabe

Masashi Iio

Kazumi Noda

Kazuhiro Yamanaka

Satoshi Shinachi

Tohru Kubota

Tatsushi Kaneko

Ichiro Kaneko

Wataru Kusaki

Junji Tsuchiya

Mitsuo Umemura

Chuanwen Lin

Hideto Kato

Keiichi Masunaga

Hyun-woo Kim

Naoki Ishibashi

Hideshi Kurihara

Keisuke Niida

Ryo Mitsui

Kentaro Kumaki

Kiyoshi Motomi

Kunio Itoh

Satoshi Okazaki

Motoo Fukushima

Takafumi Ueda

Hyun-Woo Kim

Yusuke Biyajima

Hiroyuki Urano

Katsuhiro Kobayashi

Tetsuya Inukai

Yuki Suka

Naoya Inoue

Kazuhiro Nishikawa

Yasufumi Kubota

Toshiaki Takahashi

Hiroshi Kanbara

Kazuya Honda

Kenji Yamada

Taku Morisawa

Hiroki Nonaka

Naoki Kobayashi

Terukazu Satoh

Hiroshi Kubota

Shun Kikuchi

Matsuo Nakashima

Ken-ich Takita

Katshiro Kobayashi

Hirohumi Kishita

Tomohiro Kobatashi

A resist composition comprising a base polymer and an acid generator in the form of a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with a fluorinated cyclic group and a nitro group is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Resist composition and pattern forming process

A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Resist composition and patterning process

A bio-electrode composition contains (A) an ionic polymer material, (B) an addition reaction-curable silicone having at least a hydrosilyl group, (C) a platinum-group catalyst, and a solvent. The bio-electrode composition has a water content of 0.2 mass % or less. The solvent includes one or more of an ether solvent, an ester solvent, and a ketone solvent each of which does not contain a hydroxy group, a carboxyl group, a nitrogen atom, or a thiol group. Thus, present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which does not leave residue on skin after attachment to and peeling from the skin; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode

A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

Positive resist composition and pattern forming process

An object is to obtain a composition capable of: forming a uniform film even by spray coating or even when the composition is applied in the form of ink for inkjet printing; and preventing light emission from a portion other than an ITO electrode surface when the film is mounted on an organic EL device and light is emitted from the device. A conductive polymer composition contains: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by a general formula (1); HO (D) for dispersing the composite; a water-soluble organic solvent (C); and a compound (E) shown by a general formula (2). The electric conductivity of a film with a thickness of 20 to 200 nm formed from the conductive polymer composition is less than 1.00E-05 S/cm.

Conductive polymer composition, substrate, and method for producing substrate

A conductive polymer composition containing: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by the following general formula (2); HO (D) for dispersing the composite; and a water-soluble organic solvent (C). This provides a composition which has favorable filterability and film formability, and which is capable of relieving acidity and forming a conductive film with high transparency. Moreover, since the HO dispersion of the conductive polymer compound is mixed with an organic solvent, the surface tension and the contact angle are so low that leveling property on a substrate is imparted. The composition is usable in droplet-coating methods. Since an organic solvent having a higher boiling point than HO is used as the organic solvent, the composition can avoid solid content precipitation around a nozzle and solid content precipitation due to drying between ejecting the liquid material from a nozzle tip and landing on a substrate.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound consisting of a cyclic ammonium cation and an anion derived from a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

An object is to obtain a conductive polymer composition having favorable filterability and film formability, and being capable of relieving acidity, forming a conductive film with high transparency, and imparting leveling property on a substrate, the composition being applicable in droplet-coating methods, such as spray coating and inkjet printing. The conductive polymer composition contains: a composite containing a π-conjugated polymer (A) and a polymer (B) shown by the following general formula (1); HO (D) for dispersing the composite; and a water-soluble organic solvent (C).

A bio-electrode composition contains (A) a composite of an ionic polymer material and particles. The component (A) contains the particles bonding to the polymer containing a repeating unit having a structure selected from the group consisting of salts of ammonium, lithium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide. Thus, the present invention provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and which prevents significant reduction in the electric conductivity even when wetted with water or dried; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.

Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, polymer compound, and composite

A positive resist composition comprises a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom.

A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.

Negative resist composition and pattern forming process

A bio-electrode composition contains particles having surfaces with an N-carbonyl sulfonamide salt shown by the following general formula (1). Rrepresents a linear, branched, or cyclic alkylene group having 1 to 20 carbon atoms and optionally having an aromatic group, ether group, or ester group, or an arylene group having 6 to 10 carbon atoms. Rf represents a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 10 carbon atoms, and optionally has a fluorine atom. Mrepresents an ion selected from the group consisting of lithium, sodium, potassium, and silver ions. This invention provides a bio-electrode composition capable of forming a living body contact layer for a bio-electrode which is excellent in electric conductivity and biocompatibility, light-weight, and manufacturable at low cost, and prevents significant reduction in electric conductivity even when wetted with water or dried.

Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, and silicon material particle

A positive resist composition comprising a base polymer comprising repeat units consisting of a fluorinated carboxylate, fluorinated phenoxide, fluorinated sulfonamide, fluorinated alkoxide, fluorinated 1,3-diketone, fluorinated β-keto ester or fluorinated imide anion and a nitrogen-containing cation having a tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

The resist composition includes a base polymer and a salt. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

A positive resist composition comprising a base polymer comprising repeat units having the structure of a sulfonium salt of a fluorinated phenol exhibits a high sensitivity, high resolution, low edge roughness and small size variation, and forms a pattern of good profile after exposure and development.

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Joetsu, Japan

Jun Hatakeyama