The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Apr. 08, 2022
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 205/57 (2006.01); C07C 233/54 (2006.01); C07C 311/09 (2006.01); C07C 317/44 (2006.01); C07C 381/12 (2006.01); C07D 327/08 (2006.01); C07D 333/54 (2006.01); C07D 333/76 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 205/57 (2013.01); C07C 233/54 (2013.01); C07C 311/09 (2013.01); C07C 317/44 (2013.01); C07C 381/12 (2013.01); C07D 327/08 (2013.01); C07D 333/54 (2013.01); C07D 333/76 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract
A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.