The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Sep. 13, 2019
Asml Netherlands B.v., Veldhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Laurentius Cornelius De Winter, Vessem, NL;
Wouter Joep Engelen, Eindhoven, NL;
Alexey Olegovich Polyakov, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.