The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

Feb. 02, 2011
Applicants:

Carsten Andreas Köhler, Veldhoven, NL;

Hans Van Der Laan, Veldhoven, NL;

Frank Staals, Eindhoven, NL;

Laurentius Cornelius DE Winter, Vessem, NL;

Herman Philip Godfried, Amsterdam, NL;

Inventors:

Carsten Andreas Köhler, Veldhoven, NL;

Hans Van Der Laan, Veldhoven, NL;

Frank Staals, Eindhoven, NL;

Laurentius Cornelius De Winter, Vessem, NL;

Herman Philip Godfried, Amsterdam, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.


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