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For the Inventor, By the Inventor

Veldhoven, Netherlands

Hans Van Der Laan

USPTO Granted Patents = 42 

 

Average Co-Inventor Count = 3.4

ph-index = 8

Forward Citations = 300(Granted Patents)


Company Filing History:

goldMedal41 out of 4,892 
 
Asml Netherlands B.v.
 patents
silverMedal1 out of 29 
 
Asm Lithography B.v.
 patents

Years Active: 2000-2025

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Areas of Expertise:
Lithographic Apparatus
Metrology Method
Device Manufacturing Method
Patterning Processes
Optical Imaging System
Measurement System
Aberration Measurement
Inspection Method
Scatterometry Data
Calibration Method
Dynamic Positioning Errors
Radiation Beam Inspection
42 patents (USPTO):Explore Patents
1. 12276921 - Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method (2025-04-14),
2. 12228862 - Selection of measurement locations for patterning processes (2025-02-18),
3. 11681229 - Selection of measurement locations for patterning processes (2023-06-20),
4. 10962886 - Selection of measurement locations for patterning processes (2021-03-30),
5. 10635004 - Correction using stack difference (2020-04-28),
6. 10578982 - Substrate measurement recipe design of, or for, a target including a latent image (2020-03-03),
7. 10551750 - Metrology method and apparatus and associated computer product (2020-02-04),
8. 10310388 - Metrology method and apparatus and associated computer product (2019-06-04),
9. 9958789 - Method of metrology, inspection apparatus, lithographic system and device manufacturing method (2018-05-01),
10. 8937705 - Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device (2015-01-20),
11. 8773657 - Method to determine the value of process parameters based on scatterometry data (2014-07-08),
12. 8717540 - Calculating a laser metric within a lithographic apparatus and method thereof (2014-05-06),
13. 8570489 - Lithographic projection apparatus and method of compensating perturbation factors (2013-10-29),
14. 8554510 - Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product (2013-10-08),
15. 8279405 - Lithographic apparatus and device manufacturing method (2012-10-02),

Title: Unveiling the Innovation Journey of Hans Van Der Laan in Veldhoven, NL

Introduction:

Hans Van Der Laan is a distinguished inventor based in Veldhoven, Netherlands, with an impressive portfolio of 40 patents to his name. His groundbreaking work has significantly impacted the field of patterning processes, particularly in the selection of measurement locations. Let's delve into his latest patents, career highlights, and collaborations that have shaped his innovative trajectory.

Latest Patents:

Van Der Laan's recent patents focus on the "Selection of measurement locations for patterning processes." These patents detail a sophisticated process of selecting measurement locations based on pattern data and process characteristics. By leveraging simulated results, these inventions streamline patterning processes, enhancing efficiency and precision in substrate processing.

Career Highlights:

Throughout his career, Hans Van Der Laan has been associated with leading companies in the industry. Noteworthy collaborations include his tenure at ASML Netherlands B.V. and ASM Lithography B.V., where he contributed significantly to pioneering advancements in lithography technology. His innovative spirit and technical expertise have positioned him as a key player in driving technological advancements in the field.

Collaborations:

Van Der Laan's collaborative efforts have been instrumental in driving innovation forward. Working alongside talented individuals such as Arie Jeffrey Den Boef and Antoine Gaston Marie Kiers, he has fostered a culture of creativity and excellence. These collaborations have not only led to the development of cutting-edge technologies but have also inspired a new generation of inventors to push the boundaries of what is possible.

Conclusion:

Hans Van Der Laan's relentless pursuit of innovation and unparalleled contributions to the field of patterning processes underscore his status as a visionary inventor. His ability to merge technical acumen with creative problem-solving has paved the way for transformative advancements in technology. As he continues to push the boundaries of what is achievable, the world eagerly anticipates the next chapter in his remarkable innovation journey.

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